Compound for resist and radiation-sensitive composition specification

摘要

A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.

主权项

1. An amorphous film produced by using a radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent, wherein the solid component has an absorptivity coefficient at a wavelength of 248 nm of 40 L/(cm·g) or more, and wherein the radiation sensitive composition contains a compound B which satisfies the following requirements of:
(a) having a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) having a molecular weight of 400 to 2000, and wherein a total content of the compound B and a solubilizer C is 50 to 99.999% by weight of a total weight of the solid component; wherein the compound B is represented by the following formula 1: wherein each R1 is an acid-dissociating group selected from the group consisting of substituted methyl groups, 1-substituted ethyl groups, 1-substituted n-propyl groups, 1-branched alkyl groups, silyl groups, acyl groups, 1-substituted alkoxymethyl groups, cyclic ether groups and alkoxycarbonyl groups, and two or more R1 may be the same or different; wherein each R2A is a group selected from the group consisting of halogen atom, alkyl group, cycloalkyl group, aryl group, aralkyl group, alkoxy group, aryloxy group, alkenyl group, acyl group, alkoxycarbonyl group, alkyloyloxy group, aryloyloxy group, cyano group, and nitro group, and two or more R2A may be the same or different; wherein each of R3 and R7 is a hydrogen atom or alkyl group having 1 to 6 carbon atoms; wherein R4A is a divalent group having 10 to 28 carbon atoms which includes a biphenyl structure, terphenyl structure, naphthalene structure, phenanthrene structure, or pyrene structure, or R4A together with R3 and R7 optionally represents a tetravalent group having 10 to 28 carbon atoms which includes a fluorine structure or benzophenone structure; and wherein each of k0, j0, m0, and n0 is an integer of 0 to 3, each of k1, j1, m1, and n1 is an integer of 0 to 3; and each of k2, j2, m2, and n2 is an integer of 0 to 4, satisfying 1≦k0+k1+k2≦5, 1