| 摘要 |
Obtained are a photomask and a transferring method by which a fine pattern may be clearly and precisely transferred, and a method for manufacturing a flat panel display. The photomask includes a light shielding part shielding at least some of an exposure light and a light transmitting part exposing a transparent substrate on a transparent substrate. The light shielding part includes: an edge region formed in a predetermined width along an outer periphery thereof; and a central region formed on a portion other than the edge region in the light shielding part. The central region is formed to have a phase shift amount of approximately 180 degrees for representative wavelength light which is included in the exposure light which transmits the light transmitting part. The edge region is formed to have a phase shift amount less than that of the central region for the representative wavelength light and an optical film which has transmittance of 50% or less for the representative wavelength light is formed on the edge region. |
