发明名称 |
System and method of testing through-silicon vias of a semiconductor die |
摘要 |
A method includes contacting a first group of through-silicon vias (TSVs) contacts with a multi-contact probe and applying a first voltage value to each of the first group of TSV contacts via the multi-contact probe, where the first group of TSV contacts corresponds to a first group of TSVs. The method also includes determining, based on a second voltage value detected at a particular TSV of the first group of TSVs, whether the particular TSV corresponds to a TSV test result. |
申请公布号 |
US8806400(B1) |
申请公布日期 |
2014.08.12 |
申请号 |
US201313745899 |
申请日期 |
2013.01.21 |
申请人 |
Qualcomm Incorporated |
发明人 |
Bhawmik Sudipta |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
Toler Law Group, PC |
代理人 |
Toler Law Group, PC |
主权项 |
1. A method of testing through-silicon vias (TSVs) of a semiconductor die via TSV contacts external to the semiconductor die, the method comprising:
contacting a first group of TSV contacts with a multi-contact probe and applying a first voltage value to each of the first group of TSV contacts via the multi-contact probe, wherein the first group of TSV contacts corresponds to a first group of TSVs; and determining, based on a second voltage value detected at a particular TSV of the first group of TSVs, whether the particular TSV corresponds to a TSV test result, wherein the particular TSV is coupled to a bi-directional buffer circuit. |
地址 |
San Diego CA US |