发明名称 System and method of testing through-silicon vias of a semiconductor die
摘要 A method includes contacting a first group of through-silicon vias (TSVs) contacts with a multi-contact probe and applying a first voltage value to each of the first group of TSV contacts via the multi-contact probe, where the first group of TSV contacts corresponds to a first group of TSVs. The method also includes determining, based on a second voltage value detected at a particular TSV of the first group of TSVs, whether the particular TSV corresponds to a TSV test result.
申请公布号 US8806400(B1) 申请公布日期 2014.08.12
申请号 US201313745899 申请日期 2013.01.21
申请人 Qualcomm Incorporated 发明人 Bhawmik Sudipta
分类号 G06F17/50 主分类号 G06F17/50
代理机构 Toler Law Group, PC 代理人 Toler Law Group, PC
主权项 1. A method of testing through-silicon vias (TSVs) of a semiconductor die via TSV contacts external to the semiconductor die, the method comprising: contacting a first group of TSV contacts with a multi-contact probe and applying a first voltage value to each of the first group of TSV contacts via the multi-contact probe, wherein the first group of TSV contacts corresponds to a first group of TSVs; and determining, based on a second voltage value detected at a particular TSV of the first group of TSVs, whether the particular TSV corresponds to a TSV test result, wherein the particular TSV is coupled to a bi-directional buffer circuit.
地址 San Diego CA US