| 摘要 |
Disclosed are one or more devices for routing carrier gas through a precursor compound. A container includes an internal chamber having a top portion and a bottom portion, wherein the top portion has a constant diameter, and the bottom portion has a diameter which becomes smaller from top to bottom. A perforated upper surface is disposed on the top portion and has a top plenum. A perforated bottom surface is disposed on the bottom portion and has a bottom plenum. The lower wall of the container provides desired thermal characteristics to the bottom portion. A precursor filling portion is disposed on the upper wall through the upper surface. First and second gas ports are disposed within the internal chamber through the upper wall. A deep tube is connected to the second gas port and routes the carrier gas between the second gas port and the bottom plenum. |
