PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

摘要

The present invention relates to a photosensitive resin composition. The photosensitive resin composition according to an embodiment of the present invention comprises acrylic copolymers formed by copolymerizing unsaturated carboxylic acids, unsaturated carboxylic acid anhydrides or a mixture thereof and olefin-based unsaturated compounds and a mixture thereof; a photoinitiator represented by chemical formula 1 or chemical formula 2; multi-functional acrylate oligomers; multi-functional monomers with an ethylenically unsaturated bond; and a melamine cross-linking agent.