COPOLYMERS FOR NEAR-INFRARED RADIATION-SENSITIVE COATING COMPOSITIONS FOR POSITIVE-WORKING THERMAL LITHOGRAPHIC PRINTING PLATES

摘要

There is provided a copolymer having the general structure below, wherein a, b, and d are molar ratios varying between about 0.01 and about 0.90 and c is a molar ratio varying between about 0.01 and about 0.90; A1 represents monomer units comprising a cyano-containing pendant group in which the cyano is not directly attached to the backbone of the copolymer; A2 represents monomer units comprising two or more hydrogen bonding sites; A3 represents monomer units that increase solubility in organic solvents; and A4 represents monomer units that increase solubility in aqueous alkaline solutions. There is also provided a near-infrared radiation-sensitive coating composition comprising this copolymer as well as a positive-working thermal lithographic printing plate comprising a near-infrared radiation-sensitive coating comprising this copolymer, a method of producing such a printing plate, and finally a method of printing using such a printing plate. Formula (I).

主权项

1. A copolymer having the general structure: wherein
a, b, and d are molar ratios varying between about 0.01 and about 0.90 and c is a molar ratio varying between 0 and about 0.90,A1 represents monomer units comprising a cyano-containing pendant group in which the cyano is not directly attached to the backbone of the copolymer;A2 represents monomer units comprising two or more hydrogen bonding sites;A3 represents monomer units that increase solubility in organic solvents; andA4 represents monomer units that increase solubility in aqueous alkaline solutions.