发明名称 |
IMAGE FORMING APPARATUS |
摘要 |
An image forming apparatus comprises a first exposure unit, a first image carrier, a second exposure unit, a second image carrier and an exposure signal generation unit. The first exposure unit/The second exposure unit includes a given number of light-emitting elements which are linearly arranged, and changes a light emission amount of each light-emitting element in response to an image signal corresponding to a first color/a second color which can hardly be recognized in the change of the straight line state; and the exposure signal generation unit excludes a correction during exposure for reducing the influence of the change of the straight line state of each light-emitting element at the time when the second exposure unit emits the light. |
申请公布号 |
US2014218455(A1) |
申请公布日期 |
2014.08.07 |
申请号 |
US201414164541 |
申请日期 |
2014.01.27 |
申请人 |
TOSHIBA TEC KABUSHIKI KAISHA ;KABUSHIKI KAISHA TOSHIBA |
发明人 |
Ichikawa Masaki |
分类号 |
B41J2/385 |
主分类号 |
B41J2/385 |
代理机构 |
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代理人 |
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主权项 |
1. An image forming apparatus, comprising:
a first exposure unit configured to include a given number of light-emitting elements which are linearly arranged, and change a light emission amount of each light-emitting element in response to an image signal corresponding to a first color which can hardly be recognized in the change of the straight line state; a first image carrier configured to hold an image corresponding to the light emission amount of the light from each light-emitting element of the first exposure unit; a second exposure unit configured to include a given number of light-emitting elements which are linearly arranged, and change a light emission amount of each light-emitting element in response to an image signal corresponding to a second color which can be easily recognized in the change of the straight line state; a second image carrier configured to hold an image corresponding to the light emission amount of the light from each light-emitting element of the second exposure unit; and an exposure signal generation unit configured to exclude a correction during exposure for reducing the influence of the change of the straight line state of each light-emitting element at the time when the second exposure unit emits the light. |
地址 |
Tokyo JP |