发明名称 ORBITRON PUMP AND ELECTRON RAY DEVICE PROVIDED WITH ORBITRON PUMP
摘要 <p>The amount of gas released from components constituting an orbitron pump is reduced. This orbitron pump has disposed in the inside of a chamber (4) thereof an anode (1), and absorbent material source (2), and a filament (3) for electron discharge. The anode (1) is made such that electrical heating can be carried out. Thus, the anode can be electrically cheated before an opening operation, degasification can be carried out, and the amount of gas released during pump operation can be reduced.</p>
申请公布号 WO2014119586(A1) 申请公布日期 2014.08.07
申请号 WO2014JP51875 申请日期 2014.01.29
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 KANEDA MINORU;ONISHI TAKASHI;MURAKOSHI HISAYA;ITO HIROYUKI
分类号 H01J37/18;F04B37/02;H01J41/14 主分类号 H01J37/18
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