SUBSTRATE PROCESSING METHOD AND COMPUTER STORAGE MEDIUM
摘要
<p>This substrate processing method comprises: a coating film formation step wherein a coating film that is soluble in an alkali solution is formed on a substrate; a resist pattern formation step wherein a resist pattern is formed on the coating film; a pattern processing step wherein a predetermined pattern is formed on the substrate using the resist pattern as a mask; a coating film removal step wherein the resist pattern is removed by removing the coating film with use of an alkali solution after the pattern processing step; a block copolymer application step wherein a block copolymer is applied over the substrate after the coating film and the resist pattern are removed therefrom; and a polymer separation step wherein the block copolymer is subjected to phase separation into a first polymer and a second polymer.</p>
