| 摘要 |
The present invention relates to a substrate processing device comprising a processing chamber having a substrate to be processed and having a slit at one side wall; a discharging unit positioned at the inside of the processing chamber and discharging a processing medium at the substrate; a driving unit positioned at the outside of the processing chamber, connected to the discharging unit through the slit, and moving the discharging unit in the surface direction of the substrate; and a shielding unit interposed between the discharging unit and the driving unit and shielding the driving unit from the atmosphere of the inside of the processing chamber. |
