Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition

摘要

Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.

主权项

1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
(A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom, wherein the repeating unit (c) has at least either a fluorine atom or a silicon atom; and wherein: (i) the repeating unit (c) is (c′) repeating unit having a fluorine atom and a polarity conversion group on one side chain; (ii) the resin (A) contains no fluorine atom and no silicon atom; and (iii) the amount of the resin (A) is 70 to 98 mass% based on the entire solids content of the resin composition.