发明名称 Nanoimprint method
摘要 A method for applying a patterned coating of resist onto a surface of a substrate, includes embossing flowable resist at least once, wherein the flowable resist is respectively embossed between a patterned surface of a stamp and a carrier, whereby the stamp surface is provided with a patterned resist surface. The stamp carrying a first patterned part of the resist coating and the carrier carrying a second part of the resist coating are separated from each other. The patterned resist coating is transferred, wherein the first patterned part of the resist coating on the surface of the stamp is pressed against the surface of the substrate and the patterned resist coating is transferred onto the surface of the substrate. The first patterned part of the resist coating is cured and a demolding step is performed by separating the stamp from the first patterned part of the resist coating.
申请公布号 US8795775(B2) 申请公布日期 2014.08.05
申请号 US201113035602 申请日期 2011.02.25
申请人 AMO GmbH 发明人 Koo Namil;Kim Jung Wuk;Moormann Christian
分类号 B05D3/00 主分类号 B05D3/00
代理机构 McCarter & English LLP 代理人 McCarter & English LLP
主权项 1. A method for applying a patterned coating of resist onto a surface of a substrate, comprising the steps of: embossing a resist coating of flowable resist at least once, between a stamp having a patterned surface that is at least one of a micropattern and a nanopattern and a pattern between nanopattern and micropattern comprising recesses and a carrier so as to provide the patterned surface with a patterned resist coating wherein patterned resist extends into the recesses; separating the stamp carrying a first patterned part of the resist coating that forms a continuous layer on the patterned surface of the stamp and the carrier carrying a second part of the resist coating from each other, wherein at least one of (a) the carrier is planar and (b) the second part of the resist coating forms a continuous layer on the carrier after said separating; transferring the first patterned part of the resist coating onto a surface of a substrate by pressing the first patterned part of the resist coating on the patterned surface of the stamp against the surface of the substrate; curing the first patterned part of the resist coating; and demolding the first patterned part of the resist coating from the stamp by separating the stamp from the first patterned part of the resist coating.
地址 Aachen DE