发明名称 Method of forming a structured surface using ablatable radiation sensitive material
摘要 A structured surface is formed with the method of the present invention. The method of making this structured surface includes the steps of applying an ablatable radiation sensitive coating on the major surface of the substrate, and exposing the ablatable radiation sensitive coating to radiation such that exposed portions of the ablatable radiation sensitive coating ablate from the substrate to form a structured surface. The structured surface then includes a substrate and a pattern of structures framed by at least one separation bank. The method may also include the steps of depositing a flowable material on to the structures and the separation bank to form a pattern of flowable material in the structures.
申请公布号 US8796583(B2) 申请公布日期 2014.08.05
申请号 US200410944586 申请日期 2004.09.17
申请人 Eastman Kodak Company 发明人 Ali M. Zaki;Fohrenkamm Elsie A.;Ollmann, Jr. Richard R.;Zwadlo Gregory L.
分类号 B23K26/00 主分类号 B23K26/00
代理机构 代理人 Blish Nelson Adrian
主权项 1. A method of forming a structured surface on a substrate comprising the steps of: (a) applying an ablatable radiation sensitive coating to a major surface of a substrate; and (b) patternwise exposing the ablatable radiation sensitive coating to radiation such that exposed portions of the ablatable radiation sensitive coating ablate to form structures framed by at least one separation bank on the substrate wherein the at least one separation bank is able to contain a flowable material in the structures, further comprising the step of depositing a flowable material onto the structures and onto the at least one separation bank to form a first intermediate assembly comprising a pattern of flowable material contained in the structured surface, further comprising the step of removing the separation banks to form a finished article.
地址 Rochester NY US