| 摘要 |
The purpose of the present invention is to provide a method and apparatus for detecting compensation values for variations in apparatus conditions that are altered by the charging of a sample or measuring the potential of the surface of a sample using a charged particle beam, by measuring a sample potential induced by emitting a charged particle beam. A method and apparatus are provided in order to achieve the abovementioned purpose, whereby, as a charged particle beam (1) is emitted toward a sample (23), charged particle beams (2a, 2b) released from the sample (23) are deflected by a charged particle deflector (33), and a signal obtained at that time is used to detect information regarding the potential of the sample. |
