SUBSTRATE PROCESSING DEVICE ANOMALY DETERMINATION METHOD, ANOMALY DETERMINATION DEVICE, AND SUBSTRATE PROCESSING SYSTEM AND RECORDING MEDIUM

摘要

Provided is a substrate processing device anomaly determination method, configured to comprise: an accumulation step of receiving and accumulating monitor data which denotes a state of a substrate processing device which carries out a substrate processing step of processing a substrate; an upper bound/lower bound setting step of respectively setting an upper bound and a lower bound of the monitor data; a processing result determination step of, when the monitor data of the substrate processing step exceeds either the set upper bound or the set lower bound, determining whether the result of the substrate process of the substrate processing step is normal; and an update step of, when the result of the substrate process of the substrate processing step in the processing result step is determined to be normal, treats the monitor data which exceeds the set upper bound or the set lower bound as a new upper bound or lower bound.