| 摘要 |
PROBLEM TO BE SOLVED: To provide an insulating film-forming composition capable of forming a thick insulating film having a low dielectric constant, a method of producing an insulating film using the insulating film-forming composition, and an insulating film produced by the production method.SOLUTION: The insulating film-forming composition according to the present invention contains: a siloxane polymer (A) which is a partial condensate of at least one silane compound represented by formula (a-1); and a siloxane polymer (B) which has a constituent unit (b1) represented by formula (b-1) and is different from the siloxane polymer (A). In the formula (a-1), Rrepresents a hydrogen atom or a monovalent organic group, X represents a hydrolyzable group, and n represents an integer of 0-2. In the formula (b-1), Rrepresents a single bond or a C1-C5 alkylene group, and m represents an integer of 1-5. |
