| 摘要 |
<p>PROBLEM TO BE SOLVED: To solve the problem that, in an Ag alloy film which is a reflective electrode film used as an anode of organic EL, low resistance and high reflectance are required, and smallness of surface roughness is also required; and to provide an Ag-In alloy sputtering target in which generation of abnormal discharge or splash is reduced during sputtering for forming a reflective electrode film by the Ag-In alloy.SOLUTION: An Ag-In alloy sputtering target contains In: 0.1-1.5 atom%, and the remainder has a component composition comprising Ag and inevitable impurities, and each content of elements: Si, Cr, Fe and Ni is 30 ppm or less, and further the total content is 90 ppm or less. Sb is contained as much 0.2-2.0 atom%.</p> |
