发明名称 Method and system for monitoring silane deposition
摘要 <p>A silane deposition monitoring system (30) includes a silane deposition sensor (32) and a plasma field receptor (18). A method of monitoring silane deposition in a plasma processing apparatus includes placing the silane deposition sensor (32) within a processing vessel (12) in proximity with the plasma field receptor (18) and optically assessing the silane deposition sensor (32) for silane during or following plasma silanization.</p>
申请公布号 EP2180312(B1) 申请公布日期 2014.07.30
申请号 EP20090252229 申请日期 2009.09.18
申请人 UNITED TECHNOLOGIES CORPORATION 发明人 VONTELL, JOHN H.
分类号 G01N21/73 主分类号 G01N21/73
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