发明名称 |
METHOD FOR PRODUCING SILICA-BASED GLASS SUBSTRATE FOR IMPRINT MOLD, AND METHOD FOR PRODUCING IMPRINT MOLD |
摘要 |
The present invention relates to a method for producing a silica glass substrate for an imprint mold, containing: obtaining a glass body from a glass-forming raw material containing an SiO 2 precursor; machining the glass body into a glass substrate having a predetermined shape; and removing an affected layer on a surface of the glass substrate, to produce a silica glass substrate for an imprint mold having a fictive temperature distribution in a region from the surface to a depth of 10 µm on the side to be subjected to a transfer pattern formation of the glass substrate being within ±30°C. |
申请公布号 |
EP2508492(A4) |
申请公布日期 |
2014.07.30 |
申请号 |
EP20100834550 |
申请日期 |
2010.11.30 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
KOIKE AKIO;MIYASAKA JUNKO |
分类号 |
G03F7/00;B29C33/38;B29C59/02;C03B8/04;C03B19/14;C03B20/00;C03C3/06;C03C15/00;H01L21/027 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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