发明名称 METHOD OF MANUFACTURING BASE PLATE FOR MOUNTING SEMICONDUCTOR
摘要 An objective is to provide a method for fabricating a semiconductor mounting substrate for preventing surface oxidization of a copper or a copper alloy by forming an organic anti-rust coating, reforming the organic anti-rust coating by UV ray irradiation before a dry film is stacked, and improving adhesion of a dry film resist while maintaining the anti-rust effect of copper or the copper alloy by the organic anti-rust coating. The semiconductor mounting substrate can be wound with a substrate material having a tape type so that the product yield can be improved even when a conventional fabrication apparatus is used. The method to achieve the objective includes: forming an organic anti-rust coating on a conductive layer by using a substrate material in a tape type having the conductive layer plated on the surface of a flexible member; reforming the organic anti-rust coating by irradiating the organic anti-rust coating by UV rays; stacking a photoresist on the organic anti-rust coating; forming the photoresist on a resist layer of a predetermined pattern; and forming a required circuit pattern by using the resist layer of the predetermined pattern.
申请公布号 KR20140094430(A) 申请公布日期 2014.07.30
申请号 KR20130138445 申请日期 2013.11.14
申请人 SUMITOMO METAL MINING CO., LTD. 发明人 SHINICHI NAKAMURA
分类号 H01L21/50 主分类号 H01L21/50
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