| 发明名称 | Charged particle beam writing apparatus and charged particle beam writing method | ||
| 摘要 | Provided is a charged particle beam writing apparatus including a stage which a sample can be mounted thereon, an irradiation unit which emits a charged particle beam to be irradiated on the sample, and an aperture plate which includes a first opening portion to shape the charged particle beam. The aperture plate has a stacked structure of a first member and a second member, and a position of an end portion of the first opening portion in the second member is recessed from the position of the end portion of the first opening portion in the first member. | ||
| 申请公布号 | US8791422(B2) | 申请公布日期 | 2014.07.29 |
| 申请号 | US201213706903 | 申请日期 | 2012.12.06 |
| 申请人 | Nuflare Technology, Inc. | 发明人 | Touya Takanao;Ogasawara Munehiro |
| 分类号 | G21K5/04;G21K5/08;H01J37/317;H01J37/04 | 主分类号 | G21K5/04 |
| 代理机构 | Patterson & Sheridan, LLP | 代理人 | Patterson & Sheridan, LLP |
| 主权项 | 1. A charged particle beam writing apparatus comprising: a stage on which a sample can be mounted; an irradiation unit which emits a charged particle beam to be irradiated on the sample; an aperture plate which includes a first opening portion to shape the charged particle beam; and an objective lens provided between the stage and the aperture plate, wherein the aperture plate has a stacked structure of a first member and a second member, the second member being stacked on and adhered to the first member, position of an end portion of the first opening portion in the second member is recessed from the position of an end portion of the first opening portion in the first member by between 0.5 μm and 5 μm, and a portion of the first member protruding into the first opening portion and having no portion of the second member stacked thereon has a substantially uniform thickness. | ||
| 地址 | Shizuoka JP | ||