发明名称 |
Manufacturing method of functional film |
摘要 |
An object is to provide a manufacturing method of a functional film where it is possible to stably manufacture a functional film which favorably exhibits the intended function and has excellent optical characteristics. The problem is solved by forming an uppermost organic layer of an organic layer with a thickness of 30 to 300 nm by using a coating material containing a surfactant where the content is 0.01 to 10 mass % when the uppermost organic layer is formed. |
申请公布号 |
US8790479(B2) |
申请公布日期 |
2014.07.29 |
申请号 |
US201314012504 |
申请日期 |
2013.08.28 |
申请人 |
FUJIFILM Corporation |
发明人 |
Iwase Eijiro |
分类号 |
B05D7/00;C23C28/00;C23C16/34;C23C16/02;C23C16/56;C23C16/54;C08J7/04 |
主分类号 |
B05D7/00 |
代理机构 |
Edwards Neils PLLC |
代理人 |
Edwards Jean C.;Edwards Neils PLLC |
主权项 |
1. A manufacturing method of a functional film comprising:
forming one or more organic layers and one or more inorganic layers alternately on a substrate; forming an organic layer on a surface of one of the inorganic layer as an uppermost layer; forming the inorganic layer upon whose surface the uppermost layer is able to be formed; attaching a protective film to the surface of the inorganic layer; and peeling off the protective film to form the uppermost layer, wherein the organic layer as the uppermost layer has a thickness of 30 to 300 nm and is formed by using a coating material containing an organic solvent, an organic compound, and a surfactant, and wherein the content of the surfactant in the organic layer as the uppermost layer is 0.01 to 10 mass %. |
地址 |
Tokyo JP |