发明名称 Manufacturing method of functional film
摘要 An object is to provide a manufacturing method of a functional film where it is possible to stably manufacture a functional film which favorably exhibits the intended function and has excellent optical characteristics. The problem is solved by forming an uppermost organic layer of an organic layer with a thickness of 30 to 300 nm by using a coating material containing a surfactant where the content is 0.01 to 10 mass % when the uppermost organic layer is formed.
申请公布号 US8790479(B2) 申请公布日期 2014.07.29
申请号 US201314012504 申请日期 2013.08.28
申请人 FUJIFILM Corporation 发明人 Iwase Eijiro
分类号 B05D7/00;C23C28/00;C23C16/34;C23C16/02;C23C16/56;C23C16/54;C08J7/04 主分类号 B05D7/00
代理机构 Edwards Neils PLLC 代理人 Edwards Jean C.;Edwards Neils PLLC
主权项 1. A manufacturing method of a functional film comprising: forming one or more organic layers and one or more inorganic layers alternately on a substrate; forming an organic layer on a surface of one of the inorganic layer as an uppermost layer; forming the inorganic layer upon whose surface the uppermost layer is able to be formed; attaching a protective film to the surface of the inorganic layer; and peeling off the protective film to form the uppermost layer, wherein the organic layer as the uppermost layer has a thickness of 30 to 300 nm and is formed by using a coating material containing an organic solvent, an organic compound, and a surfactant, and wherein the content of the surfactant in the organic layer as the uppermost layer is 0.01 to 10 mass %.
地址 Tokyo JP