| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for patterning graphene capable of easily forming a specified pattern of graphene.SOLUTION: On an occasion where a member for patterning 41 in which many catalyst metal layers 49 having a specified pattern have been formed on the lower surface thereof is mounted atop a mounting base 29 within a processing space PS of a processing container 11 belonging to a substrate processing device 10 and then contacted with a substrate S in which a graphene oxide film 50 has been formed on the surface thereof, each catalyst metal layer 49 is contacted with the graphene oxide film 50. |
