EXHAUST GAS TREATMENT DEVICE, ETCHING DEVICE WITH EXHAUST GAS TREATMENT FUNCTION AND EXHAUST GAS TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exhaust gas treatment device capable of reducing SFwhich is global warming gas, and also to provide an etching device with an exhaust gas treatment function, and an exhaust gas treatment method.SOLUTION: An exhaust gas treatment device includes: a reactant 32 which reacts to active fluoride contained in exhaust gas exhausted from the inside of a chamber 22 of an etching device 11 in which etching gas containing SFis turned into plasma and silicon is plasma-etched; and a reaction chamber 31 having an exhaust gas introducing port 36 capable of introducing exhaust gas therefrom, a housing part 35 housing the reactant 32 therein, and an exhaust gas lead-out port 38 from which exhaust gas coming into contact with the reactant 32 is led out.