| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a composition for forming a titanium-containing resist underlayer film for forming a resist underlayer film having excellent adhesiveness in fine patterning and excellent etching selectivity with a conventional organic film and a silicon-containing film.SOLUTION: The invention provides a composition for forming a titanium-containing resist underlayer film comprising: as component (A), a silicon-containing compound obtained by hydrolysis and/or condensation of one or more kinds of silicon compounds shown by the general formula (A-I) defined by RRRSi(OR); and, as component (B), a titanium-containing compound obtained by hydrolysis and/or condensation of one or more kinds of hydrolyzable titanium compounds shown by the general formula (B-I) defined by Ti(OR).</p> |
