发明名称 METHOD AND APPARATUS FOR FORMING THIN FILM
摘要 <p>The purpose of the present invention is to provide a method and an apparatus for forming a thin film capable of achieving with good reproducibility improvement in homogeneity and flatness of the obtained thin film, even when not using a method such as adding additives to the ink, and further capable of heat-drying the ink in a short period of time, and preventing deformation or denaturing of the substrate. The thin-film formation method is a method for forming a thin-film coating (3) by applying ink (2) to a substrate (1), wherein after applying the ink (2) to the substrate (1), a high-intensity light is irradiated on the substrate (1) surface before the ink (3) is dried in order to heat-dry the ink (2), and the thin-film formation apparatus is an apparatus for forming the thin-film coating by applying ink to the substrate, wherein the apparatus has a mechanism for applying the ink to the substrate, and a mechanism for irradiating high-intensity light on the substrate surface before the ink is dried in order to heat-dry the ink.</p>
申请公布号 WO2014112554(A1) 申请公布日期 2014.07.24
申请号 WO2014JP50673 申请日期 2014.01.16
申请人 KONICA MINOLTA, INC. 发明人 NAKAJIMA ATSUSHI
分类号 H01L21/368;H01L21/28;H01L21/288;H01L21/336;H01L29/786;H01L51/05;H01L51/40 主分类号 H01L21/368
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