| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of realizing a stable plasma discharge and a deposition preventive plate used in the plasma treatment apparatus.SOLUTION: A plasma treatment apparatus 1 is for forming a thin film on a substrate 20 by plasma in a treatment chamber 2 and includes conductive deposition preventive plates 10 and 11 which prevent deposition of insulation matter onto parts other than the substrate in the treatment chamber and function as an anode and a power supply unit applying a discharge voltage in the treatment chamber. In at least a part of the deposition preventive plates, a plurality of through holes 13 which penetrate the plate surface from the front to the back and preferably have sizes of 1-5 mm, and the deposition preventive plates provided with the through holes are arranged, preferably at an interval of 1-5 mm, so that their plate surfaces faces each other, in order to avoid disproportionation of the resistance of the deposition preventive plates and thus enable stable plasma discharge. |
