发明名称 Layer system for creating a surface layer on a surface of a substrate, vaporisation source for manufacturing a layer system
摘要 <p>A layered structure has a primary hard layer comprising silicon-containing composition. A layered structure has a primary hard layer comprising silicon-containing composition ((M oSi pAY' q)(gamma )(N rC sO t)(delta ), where M is aluminum and element chosen from II group, IVB group, VB group and VIB group of periodic table, AY' is manganese, iron, cobalt, nickel, boron, copper, IIIB group element, and element chosen from IA group, IIA group and IIIA group of periodic table, and element of lanthanoid series, (gamma ) is 40-60 and (gamma +delta ) is 100). Independent claims are included for the following: (1) arc deposition source; and (2) merging deposition source.</p>
申请公布号 EP2022870(B1) 申请公布日期 2014.07.23
申请号 EP20080157307 申请日期 2008.05.30
申请人 SULZER METAPLAS GMBH 发明人 VETTER, JÖRG;ERKENS, GEORG
分类号 C23C14/06 主分类号 C23C14/06
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