EXPOSURE DEVICE OF INDIUM TIN OXIDE PATTERN

摘要

The present invention provides an ITO pattern exposure apparatus capable of preventing the occurrence of interference fringes and maintaining good image recognition of a film mark. A mask hole (2) is formed at a position corresponding to a film mark (60) of a film mask (1), and the hole is formed by cutting the film mask (1). The mask hole (2) is sufficiently larger than the size of the film mark (60). There is no interference fringe on the mark because there is no contact between the film mask (1) and a mask holder (3) at the upper end of the film mark (60).