| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin film forming method causing little residue of organic matter in a thin film, allowing use of a base body with a low heat resistance. <P>SOLUTION: The thin film forming method includes: a coating film forming process of forming the coating film by applying on the surface of the base body a coating liquid comprising particles consisting of a metal compound having an interface photoelectrochemical reaction action on at least the surface, an organic matter modifying the surfaces of the particles, and a dispersion medium dispersing the particles with the surfaces modified with the organic matter; and an exposure process of photolyzing the organic matter modifying the surfaces of the particles by irradiating the coating film with electromagentic wave with a wavelength of promoting the interface photoelectrochemical reaction action of the metal. <P>COPYRIGHT: (C)2010,JPO&INPIT |
