发明名称 Immersion lithographic apparatus including a pressure sensor to measure pressure of the immersion liquid and a device manufacturing method
摘要 An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.
申请公布号 US8786830(B2) 申请公布日期 2014.07.22
申请号 US201012761038 申请日期 2010.04.15
申请人 ASML Netherlands B.V. 发明人 De Metsenaere Christophe;Kunst Ronald Casper;Berkvens Paul Petrus Joannes;Schneiders Mauritius Gerardus Elisabeth;Van De Winkel Jimmy Matheus Wilhelmus;Corcoran Gregory Martin Mason
分类号 G03B27/58;G03B27/32 主分类号 G03B27/58
代理机构 Pillsbury Winthrop Shaw Pittman LLP 代理人 Pillsbury Winthrop Shaw Pittman LLP
主权项 1. An immersion lithographic apparatus comprising: a projection system arranged to project an image onto a substrate held by a substrate table through an immersion liquid provided in a space between the projection system and the substrate; a pressure sensor configured to generate a pressure signal indicative of the pressure of the immersion liquid in the space the pressure sensor associated with an immersion fluid flow which flows out of the space through an opening in an opening surface; an extraction conduit configured to extract immersion liquid from the space through the opening; a positioner configured to position the substrate table to position the substrate table relative to the projection system; and a control system responsive to the pressure signal and configured to control a force applied to the substrate table by the positioner based on the pressure signal, wherein the sensor is located in the extraction conduit, and wherein the apparatus comprises an additional pressure sensor that is provided in the opening surface.
地址 Veldhoven NL