发明名称 |
In-Ga-Zn-type oxide, oxide sintered body, and sputtering target |
摘要 |
An oxide including indium (In), gallium (Ga) and zinc (Zn), wherein diffraction peaks are observed at positions corresponding to incident angles (2θ) of 7.0° to 8.4°, 30.6° to 32.0°, 33.8° to 35.8°, 53.5° to 56.5° and 56.5° to 59.5° in an X-ray diffraction measurement (CuKα rays), and one of diffraction peaks observed at positions corresponding to incident angles (2θ) of 30.6° to 32.0° and 33.8° to 35.8° is a main peak and the other is a sub peak. |
申请公布号 |
US8784699(B2) |
申请公布日期 |
2014.07.22 |
申请号 |
US201013257683 |
申请日期 |
2010.11.17 |
申请人 |
Idemitsu Kosan Co., Ltd. |
发明人 |
Yano Koki;Itose Masayuki;Kawashima Hirokazu |
分类号 |
C09D1/00;H01B1/02;C23C14/00;B32B15/00;H01L29/10;H01L29/06;H01L29/12;H01L21/00;H01L21/16;C01G15/00;C04B35/626;C23C14/08;H01L29/786;C04B35/453;C01G9/02;C23C14/34;H01L29/66;H01L21/02 |
主分类号 |
C09D1/00 |
代理机构 |
Millen, White, Zelano & Branigan, P.C. |
代理人 |
Millen, White, Zelano & Branigan, P.C. |
主权项 |
1. An oxide comprising indium (In), gallium (Ga) and zinc (Zn), wherein diffraction peaks are observed at positions corresponding to incident angles (2θ) of 7.0° to 8.4°, 30.6° to 32.0°, 33.8° to 35.8°, 53.5° to 56.5° and 56.5° to 59.5° in an X-ray diffraction measurement (CuKα rays), and one of diffraction peaks observed at positions corresponding to incident angles (2θ) of 30.6° to 32.0° and 33.8° to 35.8° is a main peak and the other is a sub peak. |
地址 |
Tokyo JP |