| 发明名称 |
PHOTOCURABLE COMPOSITION, BARRIER LAYER COMPRISING THE SAME AND ENCAPSULATED APPARATUS COMPRISING THE SAME |
| 摘要 |
The present invention relates to a photocurable composition comprising (A) a photocurable monomer and (B) a monomer represented by formula 1, a barrier layer including the same, and an encapsulated apparatus including the barrier layer. |
| 申请公布号 |
KR20140091414(A) |
申请公布日期 |
2014.07.21 |
| 申请号 |
KR20130003678 |
申请日期 |
2013.01.11 |
| 申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
KWON, JI HYE;NAM, SEONG RYONG;LEE, YEON SOO;LEE, JI YEON;LEE, CHANG MIN;CHOI, SEUNG JIB;HA, KYOUNG JIN |
| 分类号 |
C08F20/10;C08F20/26;C08L33/04;H01L23/29 |
主分类号 |
C08F20/10 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
