发明名称 |
FABRICATING METHOD OF CUSTOMIZED MASK AND FABRICATING METHOD OF SEMICONDUCTOR DEVICE USING CUSTOMIZED MASK |
摘要 |
A fabricating method of a customized mask includes forming first patterns in a mold structure, forming second patterns in the mold structure using initial masks, the mold structure having the first patterns formed therein, measuring overlap failure between the first patterns and the second patterns, and fabricating customized masks by compensating for pattern positions of the initial masks based on the measuring results, wherein compensating for the pattern positions of the initial masks includes shifting positions of at least some patterns of the initial masks according to shift directions and sizes of at least some of the first patterns. |
申请公布号 |
US2014199789(A1) |
申请公布日期 |
2014.07.17 |
申请号 |
US201314140775 |
申请日期 |
2013.12.26 |
申请人 |
LEE Jae-Han;CHO Hoo-Sung;KIM Cheol-Hong;PARK Seung-Hak |
发明人 |
LEE Jae-Han;CHO Hoo-Sung;KIM Cheol-Hong;PARK Seung-Hak |
分类号 |
H01L21/027;H01L21/66 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
1. A fabricating method of a customized mask, the fabricating method comprising:
forming first patterns in a mold structure; forming second patterns in the mold structure using initial masks, the mold structure having the first patterns formed therein; measuring overlap failure between the first patterns and the second patterns; and fabricating customized masks by compensating for pattern positions of the initial masks based on the measuring results, wherein compensating for the pattern positions of the initial masks includes shifting positions of at least some patterns of the initial masks according to shift directions and sizes of at least some of the first patterns. |
地址 |
Seoul KR |