| 发明名称 |
REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY |
| 摘要 |
In order to reduce the negative influence of reactive hydrogen on the lifetime of a reflective optical element, particularly inside an EUV lithography device, there is proposed for the extreme ultraviolet and soft X-ray wavelength region a reflective optical element (50) having a reflective surface (60) with a multilayer system (51) and in the case of which the reflective surface (60) has a protective layer system (59) with an uppermost layer (56) composed of silicon carbide or ruthenium, the protective layer system (59) having a thickness of between 5 nm and 25 nm. |
| 申请公布号 |
US2014199543(A1) |
申请公布日期 |
2014.07.17 |
| 申请号 |
US201314082865 |
申请日期 |
2013.11.18 |
| 申请人 |
CARL ZEISS SMT GmbH |
发明人 |
EHM Dirk Heinrich;HUBER Peter;MUELLENDER Stephan;VON BLANCKENHAGEN Gisela |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A reflective optical element for the extreme ultraviolet and soft X-ray wavelength region comprising a reflective surface with a multilayer system, wherein the reflective surface has a protective layer system arranged thereon with an uppermost layer composed of silicon carbide or ruthenium, the protective layer system having a thickness of between 5 nm and 25 nm. |
| 地址 |
Oberkochen DE |
