发明名称 |
SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS |
摘要 |
The present invention provides a sulfonium salt used in a resist composition that can give a pattern having a high resolution, especially an excellent rectangularity of a pattern form and a small roughness, while not readily generating a defect, in the photolithography using a high energy beam as a light source; a resist composition that contains the sulfonium salt; and a patterning process using this resist composition, wherein the sulfonium salt is shown by the following general formula (1a),;;wherein each of R and R0 independently represents a hydrogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 30 carbon atoms which may be optionally substituted by a heteroatom or interposed by a heteroatom. |
申请公布号 |
US2014199629(A1) |
申请公布日期 |
2014.07.17 |
申请号 |
US201314099678 |
申请日期 |
2013.12.06 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
OHASHI Masaki;KOBAYASHI Tomohiro;SEKI Akihiro;SAGEHASHI Masayoshi;FUKUSHIMA Masahiro |
分类号 |
G03F7/038 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
1. A sulfonium salt shown by the following general formula (1a),wherein each of R and R0 independently represents a hydrogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 30 carbon atoms which may be optionally substituted by a heteroatom or interposed by a heteroatom. |
地址 |
Tokyo JP |