A semiconductor substrate comprises: a seed layer disposed on a substrate; a buffer layer disposed on the seed layer; a plurality of nitride semiconductor layers disposed on the buffer layer; and at least one strain control layer provided between the plurality of nitride semiconductor layers. The buffer layer comprises a plurality of stepped regions and one or more heterogeneous regions. The plurality of stepped regions include the same nitride semiconductor material. The heterogeneous regions include the nitride semiconductor material which differs from the nitride semiconductor material of the stepped regions.
申请公布号
WO2014109506(A1)
申请公布日期
2014.07.17
申请号
WO2014KR00021
申请日期
2014.01.03
申请人
LG SILTRON INC.;LEE, KYE-JIN;LEE, HO-JUN;CHOI, YOUNG-JAE;EUM, JUNG-HYUN;LEE, CHUNG-HYUN