发明名称 CAPACITIVE SENSOR INTEGRATED ONTO SEMICONDUCTOR CIRCUIT
摘要 <p>There is disclosed a capacitive sensor on a passivation layer of a semiconductor circuit such as an ASIC, and a method for manufacturing such sensor. The system and method may comprise: forming a bottom electrode layer and landing pad (520) on a portion of the passivation layer located over active circuitry of the ASIC; forming a gas sensitive layer (530) onto the bottom electrode layer and the landing pad; creating a via (540) through the gas sensitive layer to expose a portion of the landing pad; forming a top electrode layer (550) onto the gas sensitive layer, wherein the top electrode layer completely overlays a surface area of the bottom electrode layer, and wherein the forming process for the top electrode layer deposits a portion of the top electrode layer into the via hole, thereby forming an electrical connection between the top electrode layer and the landing pad.</p>
申请公布号 WO2014108371(A1) 申请公布日期 2014.07.17
申请号 WO2014EP50097 申请日期 2014.01.06
申请人 MEAS FRANCE 发明人 GUILLEMET, JEAN-PAUL;DRLJACA, PREDRAG;BEELER, DANIEL;GALLORINI, ROMUALD;DUCERE, VINCENT
分类号 G01N27/22 主分类号 G01N27/22
代理机构 代理人
主权项
地址