发明名称 MEMORY CELLS AND METHODS OF FORMING MEMORY CELLS
摘要 Some embodiments include a method of forming a memory cell. A first portion of a switching region is formed over a first electrode. A second portion of the switching region is formed over the first portion using atomic layer deposition. The second portion is a different composition than the first portion. An ion source region is formed over the switching region. A second electrode is formed over the ion source region. Some embodiments include a memory cell having a switching region between a pair of electrodes. The switching region is configured to be reversibly transitioned between a low resistive state and a high resistive state. The switching region includes two or more discrete portions, with one of the portions not having a non-oxygen component in common with any composition directly against it in the high resistive state.
申请公布号 WO2014109859(A1) 申请公布日期 2014.07.17
申请号 WO2013US74411 申请日期 2013.12.11
申请人 MICRON TECHNOLOGY, INC. A CORPORATION OF THE STATE OF DELAWARE 发明人 YASUDA, SHUICHIRO;ROCKLEIN, NOEL;SILLS, SCOTT, E.;RAMASWAMY, D.V., NIRMAL;TAO, QIAN
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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