| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern image measuring method capable of accurately measuring the sidewall angle of a pattern cross section from an image obtained by imaging the pattern cross section by a scanning electron microscope.SOLUTION: The pattern image measuring method comprises the steps of: processing a pattern cross section image to extract contour line coordinate data of the cross section; extracting coordinate values corresponding to the upper part and the lower part of the pattern from the contour line coordinate; calculating the height of the pattern, two coordinate values of a measuring range, and the height of the measuring range; obtaining luminance distribution signals in an x direction corresponding to the two coordinate values; eliminating the signal components of a range corresponding to a white shadow portion peculiar to a cross-sectional SEM image from the signals; and calculating a distance between two signals by application of a mutual correlation method to the signals to calculate a sidewall angle. |
