发明名称 LOAD PORT AND EFEM
摘要 <p>There is provided a device capable of effectively increasing the number of wafers that is conveyed inside a wafer transport chamber and capable of improving the wafer conveyance processing capacity if an EFEM is used, without leading to a marked increase in installation area. A load port includes: a plurality of levels of loading tables are provided in the height direction; and wafers housed inside FOUP on top of each loading table is inserted into and removed from inside wafer transport chambers, in a state wherein each loading table is arranged at a wafer insertion/removal position on the front surface of the wafer transport chambers. The loading tables includes a transport mechanism that moves wafers forward and back in the front/rear direction, between a FOUP passing/receiving position at which the FOUP are handed over to a FOUP transport device and the wafer insertion/removal position.</p>
申请公布号 KR20140089517(A) 申请公布日期 2014.07.15
申请号 KR20147010268 申请日期 2012.11.08
申请人 SINFONIA TECHNOLOGY CO., LTD. 发明人 OGURA GENGORO;HATANO TAKAICHI
分类号 H01L21/677;B65D85/38;H01L21/673 主分类号 H01L21/677
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