| 发明名称 | Substrate carrying mechanism, substrate carrying method and recording medium storing program including set of instructions to be executed to accomplish the substrate carrying method | ||
| 摘要 | A substrate carrying mechanism includes: a base; a substrate holding member placed on the base and capable of holding a substrate and of being advanced and retracted relative to the base; four or more detecting units respectively for detecting different parts of the edge of a substrate held by the substrate holding member when the substrate holding member holding a substrate is retracted; and a controller that determines whether or not a notch formed in the edge of the substrate has been detected by one of the detecting units, on the basis of measurements measured by the four or more detecting units and corrects an error in a transfer position where the substrate is to be transferred to the succeeding processing unit on the basis of measurements measured by the detecting units excluding the one detecting unit that has detected the notch of the substrate. | ||
| 申请公布号 | US8781787(B2) | 申请公布日期 | 2014.07.15 |
| 申请号 | US201113213445 | 申请日期 | 2011.08.19 |
| 申请人 | Tokyo Electron Limited | 发明人 | Hayashi Tokutarou;Sakaguchi Kiminari |
| 分类号 | G06F15/00 | 主分类号 | G06F15/00 |
| 代理机构 | Burr & Brown, PLLC | 代理人 | Burr & Brown, PLLC |
| 主权项 | 1. A substrate carrying mechanism for carrying a substrate between a plurality of processing units comprising: a movable base for carrying a substrate between the plurality of processing units; a substrate holding member placed on the base and capable of holding a substrate and of being advanced and retracted relative to the base; four or more detecting units respectively for detecting different parts of an edge of a substrate held by the substrate holding member when the substrate holding member holding the substrate is retracted; and a controller that determines whether or not a notch formed in the edge of the substrate has been detected by one of the detecting units on the basis of measurements measured by the four or more detecting units and corrects an error in a transfer position where the substrate is to be transferred to the succeeding processing unit on the basis of measurements measured by the detecting units excluding the one detecting unit that has detected the notch of the substrate. | ||
| 地址 | Minato-Ku JP | ||