发明名称 Electrical erasable programmable read-only memory and manufacturing method thereof
摘要 An electrical erasable programmable read-only memory (EEPROM) including a floating transistor formed on a semiconductor substrate and a tunneling transistor formed on a semiconductor substrate and configured to erase electrons trapped in the floating transistor. The tunneling transistor has a source junction region and a drain junction region that are integrally joined by lateral diffusion. The EPROM maintains a small cell size without any additional mask process, and is useable as an MTP EEPROM because electrical erasure is enabled. In addition, the adjustment of the width of a gate constituting the tunneling transistor ensures an improved degree of freedom to adjust an erasure voltage can be enhanced.
申请公布号 US8779497(B2) 申请公布日期 2014.07.15
申请号 US201213438678 申请日期 2012.04.03
申请人 Dongbu HiTek Co., Ltd. 发明人 Choi Yong Keon
分类号 H01L29/788;H01L21/336;H01L27/115 主分类号 H01L29/788
代理机构 Sherr & Jiang, PLLC 代理人 Sherr & Jiang, PLLC
主权项 1. An electrical erasable programmable read-only memory (EEPROM), comprising: a floating transistor formed on a semiconductor substrate; and a tunneling transistor formed on the semiconductor substrate and configured to erase electrons trapped in the floating transistor, wherein a gate of the tunneling transistor has a narrower width than a gate of the floating transistor, wherein the tunneling transistor has a source junction region and a drain junction region that are integrally joined by lateral diffusion.
地址 Seoul KR