发明名称 |
Electrical erasable programmable read-only memory and manufacturing method thereof |
摘要 |
An electrical erasable programmable read-only memory (EEPROM) including a floating transistor formed on a semiconductor substrate and a tunneling transistor formed on a semiconductor substrate and configured to erase electrons trapped in the floating transistor. The tunneling transistor has a source junction region and a drain junction region that are integrally joined by lateral diffusion. The EPROM maintains a small cell size without any additional mask process, and is useable as an MTP EEPROM because electrical erasure is enabled. In addition, the adjustment of the width of a gate constituting the tunneling transistor ensures an improved degree of freedom to adjust an erasure voltage can be enhanced. |
申请公布号 |
US8779497(B2) |
申请公布日期 |
2014.07.15 |
申请号 |
US201213438678 |
申请日期 |
2012.04.03 |
申请人 |
Dongbu HiTek Co., Ltd. |
发明人 |
Choi Yong Keon |
分类号 |
H01L29/788;H01L21/336;H01L27/115 |
主分类号 |
H01L29/788 |
代理机构 |
Sherr & Jiang, PLLC |
代理人 |
Sherr & Jiang, PLLC |
主权项 |
1. An electrical erasable programmable read-only memory (EEPROM), comprising:
a floating transistor formed on a semiconductor substrate; and a tunneling transistor formed on the semiconductor substrate and configured to erase electrons trapped in the floating transistor, wherein a gate of the tunneling transistor has a narrower width than a gate of the floating transistor, wherein the tunneling transistor has a source junction region and a drain junction region that are integrally joined by lateral diffusion. |
地址 |
Seoul KR |