| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem in which: an insulation film between adjacent pixels, which is also called a bank, a partition wall, a barrier wall, an embankment, or the like is provided over source wiring of a thin film transistor, drain wiring of a thin film transistor, or a power supply line; an intersection part of the wiring, especially provided for different layers, has a large step as compared with other parts; and even in the case where the insulation film provided between the adjacent pixels is formed by a coating method, some areas are formed thinly due to the influence of this step and the withstand voltage at this area is lowered.SOLUTION: In the vicinity of a convex part with a large step, particularly in the vicinity of a wiring intersection part, a dummy member is disposed to ease the unevenness of the insulation film formed thereon. Upper wiring and lower wiring are formed displaced from each other so that the ends of the upper wiring and the lower wiring do not correspond to each other. |
