| 发明名称 |
METHOD OF PLASMA PROCESSING AND APPARATUSES USING THE METHOD |
| 摘要 |
A method of operating a plasma processing device includes outputting a first RF power having a first frequency and a first duty ratio, and outputting a second RF power having a second frequency higher than the first frequency and a second duty ratio smaller than the first duty ratio. The outputting of the first RF power and the outputting of the second RF power are synchronized with each other. |
| 申请公布号 |
US2014193978(A1) |
申请公布日期 |
2014.07.10 |
| 申请号 |
US201314021335 |
申请日期 |
2013.09.09 |
| 申请人 |
CHO Jung Hyun;KIM Hyung Joon;JEON Sang Jean;LEE Sang Heon;LEE Jeong Yun;JEON Kyung Yub;PASHKOVSKIY Vasily |
发明人 |
CHO Jung Hyun;KIM Hyung Joon;JEON Sang Jean;LEE Sang Heon;LEE Jeong Yun;JEON Kyung Yub;PASHKOVSKIY Vasily |
| 分类号 |
H01J37/32;H01L21/3065 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of operating a plasma processing device comprising:
outputting a first RF power having a first frequency and a first duty ratio; and outputting a second RF power having a second frequency higher than the first frequency and a second duty ratio smaller than the first duty ratio, wherein the outputting of the first RF power and of the outputting of the second RF power are synchronized with each other. |
| 地址 |
Suwon-si KR |
