FINE-GRAIN BANDING-FREE FIREPROOF METAL SPUTTERING TARGET WITH UNIFORMLY RANDOM CRYSTAL ORIENTATION, METHOD OF MANUFACTURING SUCH FILM, AND THIN FILM-BASED DEVICE AND PRODUCT MANUFACTURED THEREFROM

摘要

PROBLEM TO BE SOLVED: To provide a technique for manufacture in the form of a desired microstructure directly on a used backing plate regardless of pre-removal from the backing plate while the technique can be used to reproduce or repair a sputtering target.SOLUTION: There is provided a process of manufacturing a sputtering target assembly in an additional configuration, the process including a step of vapor-depositing a target powder material directly on a backing plate or backing tube through powder spray. The target has a fine and uniform isometric grain structure of less than 44 microns, is substantially free of any inter-particle diffusion when measured through electron back-scattering diffraction (EBSD) and free of selected texture orientation, and does not show banding of a particle size or texture through the whole target body.