PHOTOSENSITIVE RESIN COMPOSITION AND INSULATING LAYER PREPARED FROM THE SAME

摘要

The present invention relates to a photosensitive resin composition and an insulation layer manufactured thereby and, more specifically, to a photosensitive resin composition which increases stability of the transmittance of a generation film and maintains fast sensitivity by neutralizing acids caused by a high temperature bake with bases by including a heat base generator represented by chemical 1 or chemical 2; is able to maintain high transmittance even if a post process is progressed; and to an insulation layer manufactured thereby.