ETCHANT COMPOSITION FOR COPPER-CONTAINING METAL LAYER AND PREPARING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING SAME

摘要

The invention relates to an etchant composition for copper-containing metal layer, more specifically, to a etchant composition for copper-containing metal layer, which has a remarkably improved stability by comprising hydrogen peroxide (H2O2), soluble compound having N-H bond and carboxyl group in a molecule, and diethylene triamine pentaacetic acid or salt thereof, and a manufacturing method of an array substrate for liquid crystal display using the same.