| 摘要 |
PROBLEM TO BE SOLVED: To provide a silicon nozzle plate excellent in liquid resistance of a nozzle opening inner surface and an ejection surface, and provide a liquid jet head using it and a liquid jet apparatus.SOLUTION: A nozzle plate 20 is provided with a plurality of nozzle openings 21 in a silicon substrate, and on both surfaces of the silicon substrate and an inner surface of the nozzle openings 21, a tantalum oxide film 201 formed by atomic layer deposition is provided. |
