HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS

摘要

Provided is a hard mask composition which includes an aromatic ring-containing compound and a solvent including a structure unit represented by chemical formula 1. [Chemical formula 1] In chemical formula 1, L, X and n are defined as in the specification. In addition, a method for forming patterns using the hard mask composition and a semiconductor integrated circuit device including multiple patterns formed by the method are provided.